GERSGMGEquipementsGeomaterials platform Imaging and microanalysis Display the main menu

Imaging and microanalysis

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The center is dedicated to the observation of soil at scales between the micrometer and millimeter leading to the identification of the reactions between the components, especially in the treatment of soils. The equipment we use are employed to image, characterize and quantify solid samples of any kind.

The laboratory has a set of observation equipment and microanalysis for characterizing geomaterials, modified or not, and to understand their physicochemical behavior and / or geotechnics. Associated with this equipment, the laboratory uses several materials for different steps of sample preparation such as drying, cutting, impregnation ... ..etc.

These analysis methods are complementary studies typically used by geotechnical engineers in civil works.

Equipement for observations and analysis

The binocular microscope This microscope allows a first approach of materials with magnifications of X1.5 to x4. It is equipped with a camera to acquire color images.

Stéréoscope Nikon
Echantillon de sol imprégné
Quartz & fer

The optical microscope Nikon LV100 </ h3>

The optical polarizing microscope Nikon LV100 is associated with CCD camera Nikon DS-2 mV and NIS BS Element software. The microscope is equipped with 5 optical x2.5, x5, x10, x20, x50, x100 and two light sources, namely a white light or ultraviolet light (associated with the use of a fluorescent pigment).

As part of our business, the optical microscope is mainly used for two purposes:

  • Visualize the shape and color of millimeter to centimeter particles </ li>
  • Analyze a ground structure for including porosity impregnated surfaces of observations (by image analysis) </ li> </ Ul> The LV100 allows analysis of the surfaces of some μm², on a single image up to several cm by software mesh.

Microscope Nikon LV100
Comptage de grain de quartz (rouge)
Comparaison de porosité suivant compactage

The micro XRF device Brucker M4 tornado </ h3>

The XRF spectroscopy is a method for determining the composition of solid samples, liquid or powdered, measuring the thickness of layers and carry out the elemental analysis of mainly inorganic samples for a wide variety of applications.

This device offers two magnifications, X10 and X100 to acquire 200mm² mappings (single acquisition), up to several mm² realizing an automatic acquisition mesh.

Brucker M4 Tornado
Cartographie de la silice (rouge) et du calcium (bleu)
Analyse semi-quantitative d'un limon
Microscope électronique à balayage Hitachi SU5000
Cartographie chimique
Phases cimentaire dans un sol traité
Polymère et sol

The scanning electron microscope Hitachi SU5000 (SEM or SEM) </ h3>

SEM is a type of microscope that uses an electron particle beam to illuminate a specimen and create a highly magnified image. Each point on the sample of the incident electron beam collides with the material and loses energy. This energy loss is converted into other forms, such as heat, emission of secondary low energy electrons, light emission (cathodoluminescence) or X-ray emission

The SU5000 is a field emission microscope (FEG) hot cathode with five sensors and two operating conditions:

Sensors </ h4>
  • Detector of secondary electrons (SE-Topography) </ li>
  • backscattered electron detector (BSE atomic-contrast) </ li>
  • EDX detector Xflash Brucker window mm² (chemical-EDX analysis) </ li>
  • Low Vaccum SE detector (vacuum-gradient topography SELV) </ li>
  • In-lens detector, in column (Topography-TTL) </ li> </ ul>

    Conditions </ h4>
    • Fashion high vacuum (HV) </ li>
    • Fashion low vacuum (LV) between 10Pa and 300Pa </ li> </ ul>

      Description </ h4> Voltage Range </ b>
      • 0.5 to 30 kV </ li> </ ul> Resolution </ b>
        • 2.0 nm @ 1kV (* 1) </ li>
        • 1.2 nm @ 30 kV </ li>
        • 3.0 nm @ 15kV Low Vacuum Mode (* 2) </ li> </ ul> Magnification </ b>
          • Photo: 10 to 600.000 times </ li>
          • Screen: 18-1000000 times </ li> </ Ul>
          • 1.2 nm@30kV
          • 3.0 nm@15kV Low vacuum mode (*2)
          • Photo: 10-600,000 fois
          • Ecran: 18-1,000,000 fois